Semiconductor device having recessed gate regions and method of manufacturing the same

ABSTRACT

In a surface of a silicon substrate of one conductivity type, there are formed a plurality of depressions or recesses, gate regions of opposite conductivity type are formed at bottoms of respective recesses, gate electrodes are provided on respective gate regions, and an electrically conductive block is joined to the surface of the semiconductor substrate. Between the surface of the semiconductor substrate and the electrically conductive block a contact region having a high impurity concentration and/or an electrically conductive material layer may be provided in order to improve electrical and mechanical properties of the contact between the semiconductor substrate and the electrically conductive block. The gate region can have a high impurity concentration and a distance between a channel region and the electrically conductive block can be very small.

This is a Division of application Ser. No. 08/772,884 filed Dec. 24,1996, now U.S. Pat. No. 5,757,035, which in turn is a continuation ofapplication Ser. No. 08/483,590 filed Jun. 7, 1995 abandoned.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device, andparticularly to a self-extinguish type semiconductor device such as agate turn-off thyristor, static induction thyristor and static inductiontransistor. The present invention also relates to a method ofmanufacturing a semiconductor device.

2. Description of the Related Art

The above mentioned self-extinguish type semiconductor device such asgate turn-off thyristor (GTO thyristor) and static induction thyristor(SI thyristor) have been widely used as a power semiconductor device andhave been described in the following publications:

1. Junichi Nishizawa, "High Power Vertical Type Junction FET havingTriode Characteristics", Nikkei Electronics, Sep. 27, 1971, pp. 50-61

2. J. Nishizawa, T. Terasaki and J. Sibata, "Field-Effect Transistorversus Analog Transistor (Static Induction Transistor)", IEEE Trans. onElectron Device, ED-22(4), 185, 1975

3. J. Nishizawa and K. Nakamura, Physiquee Appliquee, T13, 725, 1978

4. J. Nishizawa and Y, Otsubo, Tech. Dig. 1980 IEDM, 658, 1980

5. J. Nishizawa, T. Ohmi, T. Sha and K. Mototani, Technical Report ofElectron and Communication Society, ED81-84, 1981

6. M. Ishidoh, et al, "Advanced High Frequency GTO", Proc, ISPSD, 189,1988

7. B. J. Baliga, et al, "The Evolution of Power Device Technology", IEEETrans. on Electron Device, ED-31, 1570, 1984

8. M. Amato, et al, "Comparison of Lateral and Vertical DMOS SpecificOn-resistance", IEDM Tech. Dig., 736, 1985

9. B. J. Baliga, "Modern Power Device", John Wiley Sons, 350, 1987

10. H. Milehner, et al, "A Novel 8 kV Light-Trigger Thyristor with OverVoltage Self Protection", Proc. ISPSD, 289, 1990

For the self-extinguish type power transistors, there have been proposeda buried gate type GTO thyristor and a buried gate type SI thyristor, inwhich gate regions are formed in a surface of a semiconductor substrateand then an epitaxial layer is formed on the surface of thesemiconductor substrate such that the gate regions are buried. In thiscase, a growth of the epitaxial layer has a substrate dependency. Thatis, crystal growth and impurity density distribution of the epitaxiallayer formed on the gate region differ from those of the epitaxial layerformed on the surface of the semiconductor substrate. Due to such asubstrate dependency of the epitaxial layer, it is difficult of obtain asemiconductor device having good properties. Further, the epitaxialgrowth is a process which requires a relatively long time period, sothat the efficency of manufacturing such a buried gate typesemiconductor device is low. Moreover, the conductivity type of asemiconductor region in the vicinity of the gate region is likely to beinverted. In order to mitigate the above mentioned drawbacks, there hasbeen proposed a surface gate type structure, in which gate regions areformed in a surface of a semiconductor substrate. However, in such asurface gate type semiconductor device, a large gate reverse voltagecould not be attained and thus a large current could not be interrupted.

In the known GTO thyristors, it is impossible to increase an impurityconcentration of the gate region, and therefore a carrier drawing speedis low so that a turn-off loss is large and an operating frequency islow.

In order to overcome the above mentioned problems of the buried gatetype semiconductor devices, there has been proposed a serration gatestructure, in which relatively deep recesses are formed in a surface ofa semiconductor substrate and gate regions are formed at bottoms ofthese recesses. However, it is rather difficult to form the deeprecesses even by using a dry etching, and thus it is impossible toobtain a sufficiently high breakdown voltage. Moreover, a precisionworking for forming the deep recesses is liable to be complicated.

The inventor of the instant application has proposed, in U. S. patentapplication Ser. No. 08/407,023 as well as in a corresponding EuropeanPatent Application No. 94 921826.7 contact type or joined typesemiconductor devices. In one type of these semiconductor devices,recesses or depressions are formed in a surface of a first semiconductorsubstrate, impurities are introduced into the semiconductor substratefrom bottoms of the depressions to form gate regions each having a highimpurity concentration, gate electrodes are formed on respective gateregions and a second semiconductor substrate is joined to the surface ofthe first semiconductor substrate. In another type, gate regions eachhaving a high impurity concentration are formed in a surface of a firstsemiconductor substrate, gate electrodes are formed on respective gateregions, and a second semiconductor substrate having depressions formedin a surface thereof is joined to the surface of the first semiconductorsubstrate such that the gate electrodes are accommodated in respectivedepressions formed in the surface of the second semiconductor substrate.In these joined type semiconductor devices, the above mentioned variousdrawbacks caused by the epitaxial growth can be removed. Therefore, in ajoined type GTO thyristor, the impurity concentration of the gateregions can be easily made high, and thus carriers can be drawn at ahigh speed so that the operating frequency can be raised. In the joinedtype SI thyristor, the gate regions having a high impurity concentrationcan be buried uniformly, a large area can be easily realized.

In the above mentioned joined type semiconductor devices, themanufacturing process can be effectively simplified, but a distancebetween a channel region radiating heat and an electrode having afunction for dissipating the heat is long, so that a cooling could notbe performed efficiently. This might result in a malfunction of thesemiconductor device. Moreover, the gate structures are surrounded inthe depressions formed in the surfaces of the first and/or secondsemiconductor substrates, and thus there exist vacant spaces above thegate structures. This results in a decrease in a mechanical strength anda decrease in cooling efficiency.

SUMMARY OF THE INVENTION

The present invention has for its object to provide a novel and usefulsemiconductor device, in which the above mentioned drawbacks of theknown buried gate type and serration gate type semiconductor devices canbe removed by adopting the joined structure and furthermore the abovementioned drawbacks of the joined structure can be effectivelymitigated.

According to the invention, a semiconductor device includes asemiconductor substrate of one conductivity type with a first mainsurface provided with depressions and a second main surface opposed tothe first main surface; a gate structure including semiconductor regionsof an opposite conductivity type having a high impurity concentrationand formed at the bottoms of the depressions; and an electricallyconductive block joint to the first main surface of the semiconductorsubstrate.

In a preferable embodiment of the semiconductor device according to theinvention, in the first main surface of the semiconductor substrate,there is formed a contact layer having a high impurity concentration. Byproviding such a contact layer, a property of a contact between thesemiconductor substrate and the electrically conductive block can beimproved and a contact resistance can be decreased and a mechanicalproperty can be also improved.

In another preferable embodiment of the semiconductor device accordingto the invention, an electrically conductive layer is provided on thefirst main surface of the semiconductor substrate. The electricallyconductive layer is preferably made of a same electrically conductivematerial as the electrically conductive block, but it may be made of adifferent electrically conductive material than the electricallyconductive block. In this embodiment, a good contact between thesemiconductor substrate and the electrically conductive block can beobtained and a contact resistance can be decreased. Particularly, whenthe electrically conductive layer is made of the same material as thatof the electrically conductive block, they are subjected to similarplastic deformation during a heating process, and thus electrical andmechanical characteristics of the contact can be improved.

According to the invention, the electrically conductive block may beadvantageously made of a material selected from the group consisting ofgold, silver, copper, aluminum, molybdenum, beryllium bronze, diamondand silicon carbide. These electrically conductive materials may bepreferably used together with a silicon substrate. Particularly, it ispreferable to form the electrically conductive block by a compositestructure of a first molybdenum layer and a second copper layer. In thiscase, molybdenum has a thermal expansion coefficient which is between athermal expansion coefficient of silicon and a thermal expansioncoefficient of copper, and therefore a channel region can be free from astress upon joining the electrically conductive block to the siliconsubstrate and an electrically and mechanically stable contact can beobtained.

In the semiconductor device according to the invention, it is no longernecessary to perform the epitaxial growth after forming the gatestructure, and therefore it is possible to form the gate regions havinga high impurity concentration uniformly and stably. Furthermore, sincethe electrically conductive block is directly joined to thesemiconductor substrate, a distance between the channel region and theelectrically conductive block becomes shorter than that of the abovementioned prior application and heat generated in the channel region canbe dissipated efficiently.

When the gate structure is formed in the depressions formed in thesurface of the semiconductor substrate, the gate region can have a largecross section. Therefore, the gate resistance can be decreased and acurrent flowing through a channel region can be interrupted completely.When the gate structure is formed such that a vacant space is notexistent in the depression, mechanical strength can be improved andcooling efficiency can be improved. Moreover, impurities could not behardly introduced into the gate structure and device characteristics canbe improved.

The present invention also relates to method of manufacturing the abovementioned semiconductor device according to the invention. According tothe invention, a method of manufacturing a semiconductor deviceincludes:

preparing a semiconductor substrate of one conductivity type havingfirst and second main surfaces and an electrically conductive blockhaving a surface;

forming depressions in the first main surface of the semiconductorsubstrate and diffusing opposite type of impurities into the second mainsurface of the semiconductor substrate to form an electrode region;

forming a semiconductor layer of opposite conductivity type at each ofthe bottoms of the depressions formed in the first main surface of thesemiconductor substrate;

forming a first insulating film on the semiconductor layer at each ofthe bottoms of the depressions;

removing selectively a part of the semiconductor layer formed on aninner wall of each of the depressions except for the bottom to form agate region in each of the depressions;

forming a second insulating film on the inner wall of each of thedepressions; and

joining the surface of the electrically conductive block to a portion ofthe first main surface of the semiconductor substrate which is exposedbetween adjacent gate regions.

In a preferable embodiment of the method according to the invention,prior to forming the depressions in the first main surface of thesemiconductor substrate, a contact region of one conductivity typehaving a high impurity concentration is formed in the first main surfaceof the semiconductor substrate. Then, this contact region can improvethe contact property.

According to a further aspect of the invention, a method ofmanufacturing a semiconductor device includes:

preparing a semiconductor substrate of one conductivity type havingfirst and second main surfaces and an electrically conductive blockhaving a surface;

forming depressions in the first main surface of the semiconductorsubstrate and diffusing opposite type impurities into the second mainsurface of the semiconductor substrate to form an electrode region;

forming a semiconductor layer of opposite conductivity type at each ofthe bottoms of the depressions formed in the first main surface of thesemiconductor substrate;

forming an insulating film on the semiconductor layer at each of thebottoms of the depressions;

removing selectively a part of the semiconductor layer formed on aninner wall of each of the depressions except for the bottoms to form agate region in each of the depressions;

forming an electrically good conductive gate electrode selectively onsaid gate region in each of the depressions; and

joining the surface of the electrically conductive block to a portion ofthe first main surface of the semiconductor substrate which is exposedbetween adjacent gate regions.

According to a further aspect of the invention, a method ofmanufacturing a semiconductor device includes:

preparing a semiconductor substrate of one conductivity type havingfirst and second main surfaces and an electrically conductive blockhaving a surface;

forming depressions in the first main surface of the semiconductorsubstrate and diffusing opposite type impurities into the second mainsurface of the semiconductor substrate to form an electrode region;

introducing impurities of opposite conductivity type into the first mainsurface of the semiconductor substrate at each of the bottoms of thedepressions to form a gate region of opposite conductivity type at eachof the bottoms of the depressions;

forming an insulating film on said semiconductor layer at each of thebottoms of the depressions;

removing selectively a part of the insulating film to expose a part ofthe gate region in each of the depressions;

forming an electrically good conductive gate electrode selectively onthe exposed part of the gate region in each of the depressions; and

joining said surface of the electrically conductive block to a portionof the first main surface of the semiconductor substrate which isexposed between adjacent gate regions.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross sectional view showing a first embodiment of thesemiconductor device according to the invention;

FIG. 2 is a cross sectional view illustrating a second embodiment of thesemiconductor device according to the invention;

FIG. 3 is a cross sectional view depicting a third embodiment of thesemiconductor device according to the invention;

FIG. 4 is a cross sectional view representing a fourth embodiment of thesemiconductor device according to the invention;

FIG. 5 is a cross sectional view depicting a fifth embodiment of thesemiconductor device according to the invention;

FIG. 6 is a cross sectional view representing a sixth embodiment of thesemiconductor device according to the invention;

FIG. 7 is a cross sectional view representing a seventh embodiment ofthe semiconductor device according to the invention;

FIGS. 8A to 8F are cross section views illustrating successive steps formanufacturing the semiconductor device shown in FIG. 6;

FIGS. 9A to 9I are cross sectional views representing successive stepsfor manufacturing the semiconductor device depicted in FIG. 7;

FIG. 10 is a cross sectional view showing an eighth embodiment of thesemiconductor device according to the invention; and

FIGS. 11A to 11J are cross sectional views showing successive steps formanufacturing the semiconductor device illustrated in FIG. 10.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 1 is a cross sectional view showing a first embodiment of thesemiconductor device according to the invention. In the presentembodiment, the semiconductor device is formed as a SI thyristor. In afirst main surface of a semiconductor substrate 11 formed by an N⁻silicon substrate having an N type impurity concentration of 10¹² to10¹⁶ atoms/cm³, there are formed a plurality of depressions or recesses12 with the aid of a precision working. The recesses 12 have a depth notsmaller than 10 μm and a width of 20-50 μm, and a distance betweenadjacent recesses is 3-20 μm. P type impurities are introduced into thesemiconductor substrate 11 from the bottoms of the recesses 12 to formP⁺ gate regions 13 having a P type impurity concentration of 10¹⁷ to10²¹ atoms/cm³. On the bottom surfaces of the recesses 12, there areformed gate electrodes 14 such that each gate electrodes is brought intocontact with a respective gate regions 13. The gate electrodes 14 aremade of an electrically good conductive material such as W, WSi₂, Mo andMoSi₂. In the present embodiment, in a recess 13 there is formed only agate electrode 14 and a remaining portion of the recess constitutes avacant space 15.

In a second main surface of the silicon substrate 11 opposing to thefirst surface, there is formed a P⁺ anode contact layer 16 having a Ptype impurity concentration of 10¹⁷ -10²¹ atoms/cm³ by introducing Ptype impurities into the second main surface of the silicon substrate.On this anode contact layer 16, an anode electrode 17 is formed by, forinstance sputtering, vapor deposition or plating of aluminum.

In the present embodiment, an electrically conductive block 18 is joinedto the first main surface of the semiconductor substrate 11. Accordingto the invention, it is preferable to make the electrically conductiveblock 18 of a material selected from the group consisting of gold,silver, copper, aluminum, molybdenum, beryllium bronze, diamond andsilicon carbide. These materials can be advantageously used for asilicon substrate. The electrically conductive block 18 may have athickness of 0.3-30 mm. In the present embodiment, the electricallyconductive block 18 is formed by a copper plate having a thickness of 10mm. It should be noted that the electrically conductive block 18 made ofcopper serves as a cathode of the SI thyristor.

In the SI thyristor of the present embodiment, a distance between achannel region serving as a heat generating source, i.e. a semiconductorregion interposed between adjacent gate regions 13 and the electricallyconductive block 18 is very short, and thus heat generated in thechannel region can be effectively conducted to the electricallyconductive block 18 and is dissipated therethrough. In this case, inorder to increase heating efficiency, a jacket may be provided in theelectrically conductive block 18 and a coolant may flow through thejacket.

FIG. 2 is a cross sectional view showing a second embodiment of thesemiconductor device according to the invention. Also in the presentembodiment, the semiconductor device is formed as a SI thyristor. Thepresent embodiment differs from the first embodiment shown in FIG. 1only in that in the first main surface of the semiconductor substrate11, there is formed an N⁺ contact region 19 having a high impurityconcentration of 10¹⁷ -10²¹ atoms/cm³ and having a thickness of severaltens Angstroms to several micronmeters. Then the recesses 12 are formedin this first main surface of the silicon substrate 11 such that therecesses extend beyond the contact layer 19 into a bulk of the siliconsubstrate 11. That is, a depth of the recess 12 is larger than athickness of the contact region 19. After forming the gate electrodes14, the electrically conductive block 18 serving as the cathode isjoined to the first main surface of the silicon substrate 11.

In the present embodiment, therefore, the first main surface of thesemiconductor substrate 11 comprises contact layer 19 having a highimpurity concentration with such a structure it is possible to obtain ajoined contact having properties and contact resistance can bedecreased.

FIG. 3 is a cross sectional view depicting a third embodiment of thesemiconductor device according to the invention. In the presentembodiment, an electrically conductive material layer 20 having athickness of 1-100 μm is formed on the first main surface of thesemiconductor substrate 11 made of N⁻ silicon and the electricallyconductive block 18 is joined to the electrically conductive layer 20.Also in the present embodiment, a contact resistance can be reduced. Theelectrically conductive material layer 20 has to be made of a materialwhich constitutes an ohmic contact for the semiconductor substrate 11.It is particularly preferable to make the electrically conductive block18 of a same or similar material as or to that of the electricallyconductive layer 20. Then, plastic deformation occurs due to a contactof metals, and thus good electrical and mechanical contact can beobtained easily.

FIG. 4 is a cross sectional view showing a fourth embodiment of thesemiconductor device according to the invention. Also in the presentembodiment, the semiconductor device is formed as a SI thyristor. In thepresent embodiment, in the first main surface of the semiconductorsubstrate 11, there is formed N⁺ contact layer 21 having a high impurityconcentration and having a thickness of several tens Angstroms toseveral micronmeters and an electrically conductive material layer 22having a thickness of 1-100 μm is formed on the contact layer 21. Afterforming the gate structure, the electrically conductive block 18 isjoined to the electrically conductive material layer 22. In the presentembodiment, it is possible to obtain an excellent contact condition,because the contact is a metal contact and the highly doped contactlayer 21 is interposed between the bulk of the semiconductor substrate11 and the electrically conductive block 18.

FIG. 5 is a cross sectional view showing a fifth embodiment of thesemiconductor device according to the invention. In the presentembodiment, the semiconductor device is formed as a SI thyristor. Anelectrically conductive block 31 has a composite structure consisting ofa first electrically conductive layer 31a and a second electricallyconductive layer 31b. The first electrically conductive layer 31a ismade of molybdenum and the second electrically conductive layer 31b ismade of copper. A thermal expansion coefficient of molybdenum has avalue between a thermal expansion coefficient of silicon and a thermalexpansion coefficient of copper. That is, the thermal expansioncoefficient of the copper is higher than that of the molybdenum and thethermal expansion coefficient of molybdenum is higher than that of thesilicon substrate. Therefore, a generation of stress upon heating forjoining the silicon substrate 11 and block 31 can be suppressed and amechanically stable contact can be obtained.

FIG. 6 is a cross sectional view illustrating a sixth embodiment of thesemiconductor device according to the invention formed as a SIthyristor. In all the previously explained embodiments, a gate region isformed by introducing impurities into the semiconductor substrate from abottom of a recess. In the present embodiment, gate regions 32 areformed on the bottoms of the recesses 12, and the gate regions 32 andremaining surfaces of the recesses 12 are covered with an insulatingfilm 34 made of silicon oxide. After forming the insulating film 34 onthe inner walls of the recesses 12, the electrically conductive block 18is joined to the main surface of the semiconductor substrate 11 so thatthere are formed vacant spaces above the gate structure within therecesses 12. In the present embodiment, in order to decrease a contactresistance between the semiconductor substrate 11 and the electricallyconductive block 18, in the main surface of the semiconductor substrate11 there are formed N⁺ type contact layers 19.

FIG. 7 is a cross sectional view depicting a seventh embodiment of thesemiconductor device according to the invention. Also in the presentembodiment, the semiconductor device is formed as a SI thyristor. In thefirst main surface of the N⁻ silicon substrate 11 there are formed therecesses 12, P⁺ poly-silicon film 32 is formed on the bottoms of therecesses 12, and then gate electrodes 33 are formed on respectivepoly-silicon films 32 such that the gate electrodes are not brought intocontact with the inner walls of the recesses 12. After that, theelectrically conductive block 18 is joined to to the main surface of thesilicon substrate 11. Also in the present embodiment, the gate structure32, 33 is formed partially in the recesses 12 so that there are formedvacant spaces 35 in respective recesses 21.

Now successive steps for manufacturing the semiconductor deviceillustrated in FIG. 6 will be explained with reference to FIGS. 8A to8F.

At first, as shown in FIG. 8A, a first main surface of a N type siliconsubstrate 11 is doped with N type impurities to form an N⁺ contactregion 50. Then, recesses 12 are formed in the first main surface of thesilicon substrate 11 such that the recesses 12 penetrate through thecontact regions 50. The other main surface of the silicon substrate 11is doped with P type impurities to form P⁺ anode region 16. On the firstmain surface of the silicon substrate 11 there is further formed a P⁺poly-silicon film 51. The P⁺ poly-silicon film 51 may be formed bydepositing a film by using a mixture of Si₂ H₆ (disilane)/B₂ H₆(diborane)/He and heating the silicon substrate 11 at a temperature of575° C. under a pressure of 4 10⁻³ atm, and by annealing the thusdeposited film at 1000° C. for thirty minutes.

Next as illustrated in FIG. 8B, a silicon oxide film 52 is formed on thepoly-silicon film 51 provided on the first main surface of the siliconsubstrate 11 as well as on the poly-silicon film 51 formed on thebottoms of the recesses 12 by ion beam sputtering.

Then, etching is carried out to remove a part of the poly-silicon film51 which is not covered with the silicon oxide film 52, i.e. a part ofthe poly-silicon 51 formed on the inner walls of the recesses 12 asshown in FIG. 8C. During this etching process, the silicon oxide film 52is also removed. Next, an oxidation process is carried out to form aninsulating film 53 made of silicon oxide as shown in FIG. 8D on thewhole first surface of the silicon substrate 11. Then, parts of thepoly-silicon film 51 and insulating film 52 provided on the first mainsurface of the silicon substrate 11 are removed by polishing to exposethe contact region 50 as depicted in FIG. 8E. During this polishingprocess, a part of the insulating film 53 formed in the recesses 12 isalso removed. Finally, an electrically conductive block 18 is joined tothe first main surface of the silicon substrate 11 through the contactregion 50 as illustrated in FIG. 8F, and on the P⁺ anode region 16 thereis formed an anode electrode 17. In this manner, it is possible toobtain the gate structure, in which the P⁺ poly-silicon film 51 servingas the gate regions is formed in the recesses 12, the poly-silicon film51 is covered with the insulating film 53 and the remaining portions ofthe recesses 12 form the vacant spaces 54. In this manner, the Sithyristor shown in FIG. 6 can be manufactured.

Next successive steps of another embodiment of the method ofmanufacturing the semiconductor device shown in FIG. 7 will be explainedwith reference to FIGS. 9A to 9I.

At first, as illustrated in FIG. 9A, a first main surface of an N typesilicon substrate 11 is doped with a large amount of N type impuritiesto form an N⁺ contact region 50. Then, in the first main surface of thesilicon substrate 11 there are formed recesses 12 having a depth largerthan a thickness of the contact region 50. In a second surface of thesilicon substrate 11 there is formed a P⁺ anode region 16 by introducinga large amount of P type impurities into the second main surface of thesilicon substrate 11. Further a P⁺ poly-silicon layer 51 is formed onthe first main surface of the silicon substrate 11. Next, as shown inFIG. 9B, a silicon oxide film 52 is deposited, by ion beam sputtering,on the first main surface of the silicon substrate 11 as well as on theP⁺ poly-silicon layer 51 formed on the bottoms of the recesses 12. Then,etching is carried out by using the silicon oxide film 52 as a mask toremove a part of the poly-silicon layer 51 formed on side walls of therecesses 12 as depicted in FIG. 9C. During this etching process, thesilicon oxide film 52 is also etched away.

Next, as shown in FIG. 9D, a resist 61 is uniformly applied on the firstmain surface of the silicon substrate 11, and then parts of the resist61 applied on the poly-silicon film 51 formed on the bottoms of therecesses 12 are selectively removed as shown in FIG. 9E. Then, a highmelting point metal film 62 such as W and Mo is deposited uniformly onthe first main surface of the silicon substrate 11 as depicted in FIG.9F. Next, a lift-off process is performed to leave only a part of themetal film 62 applied on the poly-silicon film 51 provided on thebottoms of the recesses 12 as depicted in FIG. 9G, and after that apolishing process is carried out to expose the contact region 51 asillustrated in FIG. 9H. Finally, an electrically conductive block 18 isjoined to the exposed surfaces of the contact regions 50 as shown inFIG. 9I and an anode electrode 17 is formed on the P⁺ anode region 16.In this manner, the SI thyristor having the structure shown in FIG. 7 ismanufactured.

FIG. 10 is a cross sectional view showing an eighth embodiment of thesemiconductor device according to the invention. In the presentembodiment, the semiconductor device is formed as a SI thyristor. Alsoin the present embodiment, the gate structure is formed by apoly-silicon film 51 provided on bottoms of recesses 12 formed in afirst main surface of a silicon substrate 11, a high melting point metalfilm 62 applied on the poly-silicon film 51, and an insulating film 63formed on the metal film 62 as well as the poly-silicon film 51 like theembodiment illustrated in FIG. 7. In the present embodiment, the gatestructure 51, 62 and 63 is not formed to fill the recesses 12, so thatthere is formed vacant space 64 in the recesses 12.

FIGS. 11A to 11J are cross sectional views showing successive steps formanufacturing the SI thyristor depicted in FIG. 10.. Steps illustratedin FIGS. 11A to 11G are identical with those shown in FIGS. 9A to 9G. Bythe step of FIG. 11G, a P⁺ poly-silicon film 51 and a high melting pointmetal film 62 have been formed on bottoms of recesses 12 formed in afirst main surface of a silicon substrate 11. In the present embodiment,in a next step represented in FIG. 11H, an insulating film 63 made ofsilicon oxide is formed uniformly on the first main surface of thesilicon substrate 11 by CVD using TEOS as a raw material gas. Thisinsulating film 63 may be formed at a temperature of 4000° C. under theatmospheric pressure by means of ozone (O₃) oxidation of TEOS (tetraethoxysilane). Next, polishing is performed to expose a contact region50 as shown in FIG. 11I, and then an electrically conductive block 18 isjoined to the exposed surface of the contact region 50 and an anodeelectrode 17 is applied on the the anode region 16 as illustrated inFIG. 11J. In this manner, the SI thyristor shown in FIG. 10 can bemanufactured.

The present invention is not limited to the embodiments so farexplained, but many modifications and alternations may be conceived bythose skilled in the art within the scope of the present invention. Forinstance, in the above mentioned embodiments, the semiconductor deviceis formed as a SI thyristor, but according to the invention, thesemiconductor device may be formed as a GTO thyristor and SI transistor.Moreover, in the above embodiments, the semiconductor substrate and theelectrically conductive block are joined together by heating them.However, according to the invention, these two members may be broughtinto contact with each other. In the above explained SI thyristors, theanode region is formed by P type semiconductor region, but according tothe invention, the anode region may be formed by an N type semiconductorregion. Furthermore, in the case of SI transistor, an emitter or drainregion may be formed by an N type semiconductor region.

As explained above in detail, in the semiconductor device according tothe invention, the electrically conductive block is joined on thesurface of the semiconductor substrate in which the recesses are formed,and therefore a distance between a heat generating channel region andthe electrically conductive block can be shortened, and thus heatgenerated in the channel region can be-effectively dissipated throughthe electrically conductive block and the cooling can be performedefficiently.

When a highly doped contact region is formed in the first surface of thesemiconductor substrate and/or an electrically conductive material layeris formed on the first main surface of the semiconductor substrate, thesemiconductor substrate and the electrically conductive block can bejoined together in an electrically and mechanically good condition.

Moreover, in the present invention, when the gate structure is providedin the recess formed in the first main surface of the semiconductorsubstrate, it is possible to decrease a gate resistance, to interrupt alarge current and to operate at a high frequency. Furthermore, in thiscase, when the gate structure is formed such that the recess iscompletely filled with the gate structure, the gate region can beeffectively prevented from being contaminated and the device propertycan be prevented from being deteriorated,.and the heat dissipation canbe further improved, because a heat can transmit through the gatestructure.

What is claimed is:
 1. A method of manufacturing a semiconductor devicecomprising the steps of:preparing a semiconductor substrate of oneconductivity type having a first and second main surfaces and anelectrically conductive block having a surface; forming depressions insaid first main surface of the semiconductor substrate and diffusingopposite type impurities into the second main surface of thesemiconductor substrate to form an electrode region; forming asemiconductor layer of opposite conductivity type at each of bottoms ofsaid depressions formed in the first main surface of the semiconductorsubstrate; forming a first insulating film on said semiconductor layerat each of the bottoms of the depressions; removing selectively a partof the semiconductor layer formed on an inner wall of each of thedepressions except for the bottom to form a gate region in each of thedepressions; forming a second insulating film on the inner wall of eachof the depressions; and joining said surface of the electricallyconductive block to a portion of the first main surface of thesemiconductor substrate which is exposed between adjacent gate regions.2. A method according to claim 1, wherein prior to forming thedepression in the first main surface of the semiconductor substrate, acontact region of one conductivity type having a high impurityconcentration is formed in the first main surface of the semiconductorsubstrate.
 3. A method of manufacturing a semiconductor devicecomprising the steps of:preparing a semiconductor substrate of oneconductivity type having a first and second main surfaces and anelectrically conductive block having a surface; forming depressions insaid first main surface of the semiconductor substrate and diffusingopposite type impurities into the second main surface of thesemiconductor substrate; forming a semiconductor layer of oppositeconductivity type at each of bottoms of said depressions formed in thefirst main surface of the semiconductor substrate; forming an insulatingfilm on said semiconductor layer at each of the bottoms of thedepressions; removing selectively a part of the semiconductor layerformed on an inner wall of each of the depressions except for thebottoms to form a gate region in each of the depressions; forming anelectrically good conductive gate electrode selectively on each of saidgate regions in the depressions; and joining said surface of theelectrically conductive block to a portion of the first main surface ofthe semiconductor substrate which is exposed between adjacent gateregions.
 4. A method according to claim 3, wherein after selectivelyforming said electrically good gate electrodes on the gate regions andprior to joining said electrically conductive block to the semiconductorsubstrate, a second insulating film is formed on the inner wall of eachof the depressions.
 5. A method according to claim or 3, wherein priorto forming the depression in the first main surface of the semiconductorsubstrate, a contact region of one conductivity type having a highimpurity concentration is formed in the first main surface of thesemiconductor substrate.
 6. A method of manufacturing a semiconductordevice comprising the steps of:preparing a semiconductor substrate ofone conductivity type having a first and second main surfaces and anelectrically conductive block having a surface; forming depressions insaid first main surface of the semiconductor substrate and diffusingopposite type impurities into the second main surface of thesemiconductor substrate; introducing impurities of opposite conductivitytype into the first main surface of the semiconductor substrate at eachof bottoms of said depressions to form a gate region of oppositeconductivity type at each of the bottoms of the depressions; forming aninsulating film on said semiconductor layer at each of the bottoms ofthe depressions; removing selectively a part of the insulating film toexpose a part of the gate region in each of the depressions; forming anelectrically good conductive gate electrode selectively on said exposedpart of the gate region in each of the depressions; and joining saidsurface of the electrically conductive block to a portion of the firstmain surface of the semiconductor substrate which is exposed betweenadjacent gate regions.
 7. A method according to claim 6, wherein saidelectrically conductive gate electrode is made of a metal.
 8. A methodaccording to claim 6, wherein said electrically conductive gateelectrode is made of a metal selected from the group consisting of W,WSiO₂, Mo and MoSiO₂.